JIANG Shu-fa, ZHANG Guo-jun. Design of a Bandgap Reference in Bipolar Process Based on Piecewise Temperature Curvature-Correct Technology[J]. 2013, 30(4): 75-78.
JIANG Shu-fa, ZHANG Guo-jun. Design of a Bandgap Reference in Bipolar Process Based on Piecewise Temperature Curvature-Correct Technology[J]. 2013, 30(4): 75-78.DOI:
Design of a Bandgap Reference in Bipolar Process Based on Piecewise Temperature Curvature-Correct Technology
This paper presents a bandgap reference in bipolar process which is used in Low - dropout linear regulator.The reference has an enable circuit to reduce the power consumption in shutdown mode.When the circuit is shutdown
the current to ground is 34.419pA.Considering the Low-dropout linear regulators application environment
a piecewise curvature - corrected technology is used for reducing the voltage drift when the chip temperature is high.The PPM of this circuit is 25.7/ C when the temperature is switch form -40℃to 140℃.The reference is designed without any operational amplifier to reduce the impact of the Op-Amps offset voltage and the PSRR of this bandgap reference is -80.33dB.The reference skews 0.3mV under the supply voltage ranging from 2.5V to 6V.