Gas-sensitive Characteristics Research of Al/CuPc/Cu Schottky Diode
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Gas-sensitive Characteristics Research of Al/CuPc/Cu Schottky Diode
Vol. 17, Issue 2, Pages: 127-130(2012)
作者机构:
哈尔滨理工大学应用科学学院
作者简介:
基金信息:
DOI:
CLC:TN311.7
Published:2012
稿件说明:
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WANG Dong-xing, LIU Xiao-lian, JIAO Bing-bing, et al. Gas-sensitive Characteristics Research of Al/CuPc/Cu Schottky Diode[J]. 2012, 17(2): 127-130.
DOI:
WANG Dong-xing, LIU Xiao-lian, JIAO Bing-bing, et al. Gas-sensitive Characteristics Research of Al/CuPc/Cu Schottky Diode[J]. 2012, 17(2): 127-130.DOI:
Gas-sensitive Characteristics Research of Al/CuPc/Cu Schottky Diode
was prepared by sputtering and evaporation coating techniques.This device has high sensitivity of NO2 gas
simple process and lower cost.Sensitive characteristics of the device is represented through its changes of electrical properties in the NO2 gas.The results show that the positive current of the device significantly increased in the 10 ppm NO2 gas environment.The change of Schottky barrier height is compared when the dev...