TAN Chao, DAI Li, HAN Xian-bo, et al. Curie Temperature and Optical Damage Resistance of Hf:Ce:Fe:LiNbO3 Crystals with Different Hf Concentrations[J]. 2019, 24(5): 134-137.
DOI:
TAN Chao, DAI Li, HAN Xian-bo, et al. Curie Temperature and Optical Damage Resistance of Hf:Ce:Fe:LiNbO3 Crystals with Different Hf Concentrations[J]. 2019, 24(5): 134-137.DOI: 10.15938/j.jhust.2019.05.022.
Curie Temperature and Optical Damage Resistance of Hf:Ce:Fe:LiNbO3 Crystals with Different Hf Concentrations
A series of Hf:Ce:Fe:LiNbO3 crystal with variousHf4+(2
4
6
8mol%) ion concentration were grown by Czochralski method In order to study the effect of different doping concentration of Hf4+ ion on curie temperature and optical damage resistibility of Hf:Ce:Fe:LiNbO3 crystal Differential thermal analysis curve of Hf:Ce:Fe:LiNbO3 crystal was measured by differential thermal analyzers
and the curie temperature change of the crystal was analyzed The optical damage resistance of the crystal was measured by the facula distortion methodThe experimental results show that the Curie temperature increased by 20℃ and reaches the maximum of 1224℃ when the doping concentration of Hf4+ ions was 4mol% As the concentration of Hf4+ ions in the crystal increases
the optical damage resistanceability increases The optical damage resistance ability of the Hf(8mol%):Ce:Fe:LiNbO3 crystal is two orders of magnitude than Hf(2mol%):Ce:Fe:LiNbO3
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