Based on the maskless lithography system with DMD

a new IC layout data interface algorithm has been presented

which established the interface from layout data to exposure data. The interface can meet the needs of digital lithography system

using process layer as a unit to convert the high precision IC layout data into the gray data automatically with the same pixel structure with DMD. And the interface are compatible with the two industrial standard IC layout data of GDSII and CIF

which can easily deal with all of the basic graphic element of GDSII and CIF

meanwhile

it also can utilize the method of vector algorithm calculation to succeed in solving the difficult conversion in intersecting

overlapping or some other special composed graphic. After lots of experiment

its proved that the interface has the capability of low complexity

high precision

and high efficiency. And it can he used as a new efficient passage to be research has practical significance to the production of the LSI.