1. 桂林电子科技大学 机构 电子工程与自动化学院,广西,桂林,541004
2. 桂林电子科技大学 机电工程学院,广西,桂林,541004
纸质出版:2016
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尚玉玲, 钱伟, 李春泉, 豆鑫鑫. TSV互连结构传输性能分析及故障建模研究[J]. 微电子学与计算机, 2016, 33(6): 73-77.
SHANG Yu-ling, QIAN Wei, LI Chun-quan, et al. Analysis Transmission Performance of TSV Interconnect Structure and Fault Model[J]. 2016, 33(6): 73-77.
随着集成电路复杂度的提高以及半导体制造工艺水平的不断发展
硅通孔(Through Silicon Via)TSV技术成为三维集成电路的一种主流互连技术
建立单个TSV的三维物理模型
通过回波损耗来分析不同物理参数和尺寸变化对信号传输性能的影响; 利用硅通孔的参数提取模型对其进行RLC参数的提取
并建立等效的电路模型和故障电路模型.扫描频率在10 GHz范围内
利用故障电路末端电压来分析故障的大小
同时通过最小二乘法拟合一条根植电压曲线来判断故障大小.
With the increasing complexity of IC and the development of the semiconductor manufacturing process
through silicon via(TSV) has become a main interconnect technology for 3D-IC. 3D physical model of single TSV is built to analyze the effect of different physical parameter and changing size on the performance of signal transmission by return loss.The parameter extraction model of TSV is adopted to obtain the parameter of RLC.Furthermore
both the equivalent circuit model and the fault circuit model are established. The value of the crack is determined by the changing terminal voltage of the fault circuit in the frequency range of 10 GHz.At the same time
the curve on judging the value of crack is estimated with the least square method.
庞诚, 王志, 于大全. TSV结构的几种SPICE模型仿真[J]. 半导体技术, 2013, 38(10): 770-775. DOI: 770
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李琰. TSV建模与耗散分析[D]. 西安: 西安电子科技大学, 2014.
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Pak J S, Ryu C, Kim J. Electrical characterization of through silicon via (TSV) depending on structural and material parameters based on 3D full wave simulation[C]//Proceedings of International Conference on Electronic Materials and Packaging. New York, USA: IEEE, 2007: 1-6.
Chen Po-yuan, Wu Cheng-wen, Kwai Ding-ming. On-chip testing of blind and open-sleeve TSVs for 3D IC before bonding[C]//Proceedings of 28th IEEE VLSI Test Symposium. Santa Cruz, USA: IEEE, 2010: 263-268.
蒋剑锋, 赵振宇, 邓全, 等. 3DSRAM中的TSV开路故障模型研究[J]. 计算机工程与科学, 2014, 36(12): 2331-2338. DOI: 2331
HO S W, Yoon S W, Zhou Q E, et al. High RF performance TSV silicon carrier for high frequency application[C]//Proceedings of 58th Electronic Components and Technology Conference. New York, USA: IEEE, 2008: 1946-1952.
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