BSTRACTHerein we report on how to render Ti

3

C

2

T

x

(MXene) monolayers deposited on SiO

2

/Si wafers

with different SiO

2

thicknesses

visible. Inputting the effective thickness of a Ti

3

C

2

T

x

monolayer (1 ± 0.2 nm) measured by atomic force microscopy

and its refractive index into a Fresnel-law-based simulation software

we show that the optical contrast of Ti

3

C

2

T

x

monolayers deposited on SiO

2

/Si wafers depends on the SiO

2

thickness

number of MXene layers

and the light’s wavelength. The highest contrast was found for SiO

2

thicknesses around 220 nm. Simulations for other substrates

namely

Al

2

O

3

/Si

HfO

2

/Si

Si

3

N

4

/Si and Al

2

O

3

/Al

are presented as supplementary information.