Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD

A. V. Pshyk; E. Coy; M. Kempiński; B. Scheibe; S. Jurga

doi:10.1080/21663831.2019.1594428

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Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD

Original Report | 更新时间：2026-08-19

- Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD
- Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD
- 材料研究快报（英文） 2019年7卷第6期页码：244-250
- 作者机构：
  
  1. NanoBioMedical Centre Adam Mickiewicz University
  2. NanoBioMedical Centre Adam Mickiewicz University Poznań Poland
  3. Faculty of Physics Adam Mickiewicz University
- 作者简介：
- 基金信息：
- DOI：10.1080/21663831.2019.1594428
  中图分类号：
- 网络首发：2019-03-24，
  
  纸质出版：2019
- 稿件说明：
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A. V. Pshyk, E. Coy, M. Kempiński, 等. Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD[J]. 材料研究快报（英文）, 2019,7(6):244-250.

A. V. Pshyk, E. Coy, M. Kempiński, et al. Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD[J]. Materials Research Letters, 2019, 7(6): 244-250.
A. V. Pshyk, E. Coy, M. Kempiński, 等. Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD[J]. 材料研究快报（英文）, 2019,7(6):244-250. DOI： 10.1080/21663831.2019.1594428.

A. V. Pshyk, E. Coy, M. Kempiński, et al. Low-temperature growth of epitaxial Ti2AlC MAX phase thin films by low-rate layer-by-layer PVD[J]. Materials Research Letters, 2019, 7(6): 244-250. DOI： 10.1080/21663831.2019.1594428.

摘要

Abstract

BSTRACTHere we report on the structural and tribo-mechanical characterization of epitaxial single-crystalline Ti

AlC MAX phase thin films

grown by means of electron beam physical vapor deposition at relatively low temperature (700°C). The growth of phase pure Ti

AlC at a relatively lower temperature when compared to other PVD methods was achieved utilizing a relatively low deposition rate and layer-by-layer deposition technique. The epitaxial growth is evidenced through the combination of XRD

HR-TEM and Raman spectroscopy measurements. The nanomechanical and micro-scale tribological properties of the Ti

AlC thin films were studied by means of nanoindentation and nanoscratch tests.

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相关机构

b National Key Laboratory for Precision Hot Processing of Metals School of Materials Science and Engineering Harbin Institute of Technology

a School of Materials Science and Engineering Taizhou University

School of Materials Engineering Purdue University West Lafayette

c Materials & Processes Laboratory Marshall Space Flight Center National Aeronautics and Space Administration Huntsville

a Department of Material Science and Engineering University of North Texas Denton

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