Ultrathin epitaxial NbN superconducting films with high upper critical field grown at low temperature

Xiucheng Wei; Pinku Roy; Zihao Yang; Di Zhang; Zihao He; Ping Lu; Olivia Licata; Haiyan Wang; Baishakhi Mazumder; Nag Patibandla; Yong Cao; Hao Zeng; Mingwei Zhu; Quanxi Jia

doi:10.1080/21663831.2021.1919934

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Ultrathin epitaxial NbN superconducting films with high upper critical field grown at low temperature

Original Report | 更新时间：2026-08-19

- Ultrathin epitaxial NbN superconducting films with high upper critical field grown at low temperature
- Ultrathin epitaxial NbN superconducting films with high upper critical field grown at low temperature
- 材料研究快报（英文） 2021年9卷第8期页码：336-342
- 作者机构：
  
  1. a Department of Physics University at Buffalo – the State University of New York Buffalo
  2. b Department of Materials Design and Innovation University at Buffalo – the State University of New York Buffalo
  3. c Applied Materials Inc. Santa Clara
  4. d School of Materials Engineering Purdue University West Lafayette
  5. e Sandia National Laboratories Albuquerque
- 作者简介：
- 基金信息：
- DOI：10.1080/21663831.2021.1919934
  中图分类号：
- 网络首发：2021-04-29，
  
  纸质出版：2021
- 稿件说明：
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Xiucheng Wei, Pinku Roy, Zihao Yang, 等. Ultrathin epitaxial NbN superconducting films with high upper critical field grown at low temperature[J]. 材料研究快报（英文）, 2021,9(8):336-342.

Xiucheng Wei, Pinku Roy, Zihao Yang, et al. Ultrathin epitaxial NbN superconducting films with high upper critical field grown at low temperature[J]. Materials Research Letters, 2021, 9(8): 336-342.
Xiucheng Wei, Pinku Roy, Zihao Yang, 等. Ultrathin epitaxial NbN superconducting films with high upper critical field grown at low temperature[J]. 材料研究快报（英文）, 2021,9(8):336-342. DOI： 10.1080/21663831.2021.1919934.

Xiucheng Wei, Pinku Roy, Zihao Yang, et al. Ultrathin epitaxial NbN superconducting films with high upper critical field grown at low temperature[J]. Materials Research Letters, 2021, 9(8): 336-342. DOI： 10.1080/21663831.2021.1919934.

摘要

Abstract

Ultrathin (5–50 nm) epitaxial superconducting niobium nitride (NbN) films were grown on AlN-buffered

-plane Al

by an industrial scale physical vapor deposition technique at 400°C. Both X-ray diffraction and scanning electron microscopy analysis show high crystallinity of the (111)-oriented NbN films

with a narrow full-width-at-half-maximum of the rocking curve down to 0.030°. The lattice constant decreases with decreasing NbN layer thickness

suggesting lattice strain for films with thicknesses below 20 nm. The superconducting transition temperature

the transition width

the upper critical field

the irreversibility line

and the coherence length are closely correlated to the film thickness.

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相关机构

Department of Electrical and Systems Engineering University of Pennsylvania Philadelphia

Materials Science and Technology Division Los Alamos National Laboratory Los Alamos

Center for Integrated Nanotechnologies Materials Phycicsand Applications Division Los Alamos National Laboratory Los Alamos

Department of Materials Science and Engineering Massachusetts Institute of Technology Cambridge

Department of Materials Science and Engineering Texas A&M University College Station

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