Considering very large error of current back sputtering model

a model of higher accuracy was proposed. A improved ion current density model was used to calculate the back sputtering deposition in the 80 cm position deviating from the thruster while the Reynolds model had a big error. The calculated results agreed well with the experiment result. Then

the verified model was used to calculate the back sputtering deposition of bare chamber and the chamber with anti-sputtering target. The results showed that

the deposition rate of bare chamber case was 2.36×10-10 g/(cm2·s)

while the anti-sputtering target shield case was 2.51×10-11 g/(cm2·s). It was clear that the back sputtering deposition yield with anti-sputtering target shield was an order of magnitude lower than the vacuum chamber without the anti-sputtering target.