张辉1, 2, 满青珊1, 等. 刻蚀条件对石英各向异性刻蚀特征的作用机理及KMC数值模拟[J]. 江苏大学学报（自然科学版）, 2020,41(2).

张辉1, 2, 满青珊1, et al. Effect of etching conditions on anisotropic etch rates of quartz and KMC simulation[J]. Journal of jiangsu University(Natural Science Edition), 2020, 41(2).

张辉1, 2, 满青珊1, 等. 刻蚀条件对石英各向异性刻蚀特征的作用机理及KMC数值模拟[J]. 江苏大学学报（自然科学版）, 2020,41(2). DOI： 10.3969/j.issn.1671-7775.2020.02.016.

张辉1, 2, 满青珊1, et al. Effect of etching conditions on anisotropic etch rates of quartz and KMC simulation[J]. Journal of jiangsu University(Natural Science Edition), 2020, 41(2). DOI： 10.3969/j.issn.1671-7775.2020.02.016.